Very Large Scale Integration (VLSI) layout editor featuring grid/polar array generator and .wav format stereo audio output of rastered toolpaths for sub-micron Electron Beam Lithography pattern writing.
chain scission or cross-linking of MMA / PMMA (Polymethylmethacrylate) depending on the gradation curve of the e-beam resist and the electron dose absorbed by the e-beam resist to mask the substrate from corrosion during etching.
also suitable for Ion Beam implantation deflection coils.
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